• DocumentCode
    1936558
  • Title

    Sensitivities improvement by utilizing dark mode of bright filed inspection

  • Author

    Li, Hsiao-Leng ; Chung, Yen ; Hung, Che-Lung ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chou ; Lu, Chih-Yuan

  • Author_Institution
    Technol. Dev. Center, Macronix Int. Co. Ltd., Hsinchu, Taiwan
  • fYear
    2012
  • fDate
    4-4 Sept. 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Advanced bright field (BF) inspection tool bundles with many powerful features to improve its resolution and sensitivity. However, it usually takes much time for creating an effective monitoring recipe for suppressing the background signal. This paper demonstrates the benefit of BF dark mode inspection for suppressing the interferences of nuisance and pre-layer.
  • Keywords
    inspection; semiconductor technology; BF dark mode inspection; BF inspection tool; background signal suppression; bright field inspection; nuisance interference suppression; prelayer interference suppression; sensitivity improvement; wafer noise; Broadband communication; Etching; Image edge detection; Inspection; Lighting; Monitoring; Sensitivity; Bright Field Inspection; Bright Mode; Dark Mode; Defect of Interest; Sensitivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    e-Manufacturing & Design Collaboration Symposium (eMDC), 2012
  • Conference_Location
    HsinChu
  • Print_ISBN
    978-1-4673-4540-8
  • Type

    conf

  • DOI
    10.1109/eMDC.2012.6338439
  • Filename
    6338439