Title :
Invited speech: The practical manufacturing focus on the N20 & below
Author_Institution :
Synopsys Taiwan, Taiwan
Abstract :
Summary form only given. We are facing the great manufacturing challenge for the N20 and below. We observed the next generation lithography technology is delayed for the semi-conductor process requirement. There are soft technology that were pushing to applied for the delay to meat the future. We will show our focus on helping the recent development on the process modeling & FinFET device relative.
Keywords :
lithography; semiconductor technology; FinFET device; field effect transistor; manufacturing focus; next generation lithography technology; process modeling; semiconductor process requirement; soft technology; Collaboration; Engineering profession; Graphics; Industries; Manufacturing; Nails; Speech;
Conference_Titel :
e-Manufacturing & Design Collaboration Symposium (eMDC), 2012
Conference_Location :
HsinChu
Print_ISBN :
978-1-4673-4540-8
DOI :
10.1109/eMDC.2012.6338441
