• DocumentCode
    1937468
  • Title

    Test vehicle for MCM-D interconnect process development

  • Author

    Westbrook, Scott

  • Author_Institution
    MicroModule Systems, Cupertino, CA, USA
  • fYear
    1993
  • fDate
    15-18 Mar 1993
  • Firstpage
    106
  • Lastpage
    110
  • Abstract
    A test vehicle that allows for the evaluation of DC interconnect parametrics of lines and vias is discussed. Defect assessment test structures are also included to electrically evaluate open and short defects and their apparent size. Interconnect parametrics include effective electrical linewidth, sheet resistance, and via resistance as a function of via size. Defect assessment structures are designed as multiple serpentine via string and line structures that aid in the unambiguous detection of defects. Such structures can also classify the apparent size of the defect. The data available from this vehicle show the degree of process control achieved and the potential yield of the interconnect for a product application
  • Keywords
    integrated circuit testing; metallisation; multichip modules; process control; DC interconnect parametrics; MCM-D interconnect process; defect assessment test structure; effective electrical linewidth; multiple serpentine via string; process control; sheet resistance; test vehicle; via resistance; via size; wafer scale IC process; Aluminum; Capacitance measurement; Conductive films; Electric resistance; Integrated circuit interconnections; Integrated circuit technology; Integrated circuit testing; Probes; Substrates; Vehicles;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Multi-Chip Module Conference, 1993. MCMC-93, Proceedings., 1993 IEEE
  • Conference_Location
    Santa Cruz, CA
  • Print_ISBN
    0-8186-3540-1
  • Type

    conf

  • DOI
    10.1109/MCMC.1993.302143
  • Filename
    302143