DocumentCode
1938253
Title
A Consistent Pair-diffusion Based Steady-state Model for Phosphorus Diffusion
Author
Dürr, R. ; Pichler, P.
Author_Institution
Lehrstuhl fÿr Elektronische Bauelemente, Universitÿt Erlangen-Nÿrnberg, Artilleriestrasse 12, D-8520 Erlangen, BRD
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
297
Lastpage
301
Abstract
A simplified model for phosphorus diffusion has been developed. Assuming dopant diffusion to proceed by impurity-point defect pairs, the complete system of coupled partial differential equations describing both reaction kinetics and diffusion has been consistently simplified. The resulting equations are solved numerically. Important features of phosphorus diffusion arise naturally from the solution.
Keywords
Differential equations; Electrostatic analysis; Kinetic theory; Partial differential equations; Semiconductor process modeling; Silicon; Steady-state; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436606
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