Ion Beam Lithography

Author

Stengl, Gerhard ; Löschner, Hans ; Hammel, Ernst ; Wolf, Edward D.

Author_Institution

INS - Ion Microfabrication Systems GmbH, A - 1020 Vienna, Austria

fYear

1987

fDate

14-17 Sept. 1987

Firstpage

625

Lastpage

633

Keywords

Brightness; Electron beams; Ion beams; Ion sources; Lithography; Optical scattering; Particle beam optics; Production; Proximity effect; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Device Research Conference, 1987. ESSDERC '87. 17th European

Conference_Location

Bologna, Italy

Print_ISBN

0444704779

Type

Filename

5436702

Link To Document