DocumentCode :
1942128
Title :
Evaluation of dynamic bonding stress and interlayer cracking using a combo sensor
Author :
Miki, Yoshihiko ; Watanabe, Hirobumi
Author_Institution :
Corp. Technol. Dev. Group, Ricoh Co., Ltd., Ikeda, Japan
fYear :
2012
fDate :
19-22 March 2012
Firstpage :
203
Lastpage :
205
Abstract :
Crack defect in the interlayers of semiconductor chips due to assembly stress can be a serious problem. To analyze the crack-generating stress, we fabricated a combo sensor that enables simultaneous evaluation of stress and cracking under the bonding pad. Dynamic analysis of the bonding process with this sensor in situ showed that the cracks are generated by stress concentration in alloy aggregates that form during the initial stage of ultrasonic bonding.
Keywords :
crack-edge stress field analysis; monolithic integrated circuits; sensors; ultrasonic bonding; assembly stress; bonding pad; bonding process dynamic analysis; combo sensor; crack defect; crack-generating stress analysis; dynamic bonding stress evaluation; interlayer cracking; semiconductor chips; stress concentration; stress simultaneous evaluation; ultrasonic bonding; Coordinate measuring machines; Facsimile; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2012 IEEE International Conference on
Conference_Location :
San Diego, CA
ISSN :
1071-9032
Print_ISBN :
978-1-4673-1027-7
Type :
conf
DOI :
10.1109/ICMTS.2012.6190647
Filename :
6190647
Link To Document :
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