DocumentCode
1942128
Title
Evaluation of dynamic bonding stress and interlayer cracking using a combo sensor
Author
Miki, Yoshihiko ; Watanabe, Hirobumi
Author_Institution
Corp. Technol. Dev. Group, Ricoh Co., Ltd., Ikeda, Japan
fYear
2012
fDate
19-22 March 2012
Firstpage
203
Lastpage
205
Abstract
Crack defect in the interlayers of semiconductor chips due to assembly stress can be a serious problem. To analyze the crack-generating stress, we fabricated a combo sensor that enables simultaneous evaluation of stress and cracking under the bonding pad. Dynamic analysis of the bonding process with this sensor in situ showed that the cracks are generated by stress concentration in alloy aggregates that form during the initial stage of ultrasonic bonding.
Keywords
crack-edge stress field analysis; monolithic integrated circuits; sensors; ultrasonic bonding; assembly stress; bonding pad; bonding process dynamic analysis; combo sensor; crack defect; crack-generating stress analysis; dynamic bonding stress evaluation; interlayer cracking; semiconductor chips; stress concentration; stress simultaneous evaluation; ultrasonic bonding; Coordinate measuring machines; Facsimile; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures (ICMTS), 2012 IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
1071-9032
Print_ISBN
978-1-4673-1027-7
Type
conf
DOI
10.1109/ICMTS.2012.6190647
Filename
6190647
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