DocumentCode

1942902

Title

Strain Compensated Epitaxial Etchstop For Besoi

Author

Maszara, W.P.

Author_Institution

Allied-Signal Aerospace Co., Columbia, MD

fYear

1992

fDate

6-8 Oct. 1992

Firstpage

6

Lastpage

7

Keywords

Atomic layer deposition; Boron; Capacitive sensors; Epitaxial layers; Etching; Optical films; Optical microscopy; Silicon; Strain measurement; Stress;

fLanguage

English

Publisher

ieee

Conference_Titel

SOI Conference, 1992. IEEE International

Conference_Location

Ponte Vedra Beach, FL

ISSN

1078-621X

Print_ISBN

0-7803-7439-8

Type

conf

DOI

10.1109/SOI.1992.664769

Filename

664769