Title :
Monolithic integration of semiconductor lasers and diffractive optical elements
Author :
Larsson, A. ; Eriksson, N. ; Bengtsson, J. ; Martinsson, H. ; Vukusic, J. ; Kristjansson, S. ; Modh, P.
Author_Institution :
Dept. of Microelectron., Chalmers Univ. of Technol., Goteborg, Sweden
Abstract :
Diffractive optical elements etched at the semiconductor/air interface of surface emitting lasers allow for advanced beam shaping with near diffraction limited performance. The large emission window, possible with surface emitting geometries, provides for high resolution imaging.
Keywords :
diffractive optical elements; holographic gratings; integrated optics; laser cavity resonators; optical fabrication; optical focusing; optical interconnections; semiconductor lasers; sputter etching; surface emitting lasers; VCSEL; advanced beam shaping; beam quality; binary reliefs; chemically assisted reactive ion etching; computer generated waveguide holograms; diffractive optical elements; electron beam lithography; focused beam generation; grating coupled laser; high resolution imaging; in-plane laser; large emission window; master-oscillator power-amplifier lasers; monolithic integration; near diffraction limited performance; optical fanout; semiconductor lasers; semiconductor/air interface; shallow surface structures; short distance optical interconnects; single spatial mode; surface emitting lasers; unstable resonator lasers; Gratings; Integrated optics; Monolithic integrated circuits; Optical diffraction; Optical receivers; Optical surface waves; Semiconductor lasers; Stimulated emission; Surface emitting lasers; Vertical cavity surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
DOI :
10.1109/CLEOPR.2001.967887
