Title :
CMOS-Technology - Status, Trends and Applications
Author :
Neppl, F. ; Pfleiderer, H.-J.
Author_Institution :
Siemens AG, Corporate Research and Development, Microelectronics, Otto-Hahn-Ring 6, D-800 Mÿnchen 83, F.R.G.
Abstract :
Todays CMOS technology is reviewed with respect to process architecture, acquired CMOS specific device know-how, design and applications. The process and device related problems of further miniaturization are discussed. Trends of innovative device design and technology concepts able to overcome these problems are summarized. Finally examples are given for future CMOS applications.
Keywords :
CMOS process; CMOS technology; Circuit noise; Hot carriers; Lithography; MOS devices; Marketing and sales; Power dissipation; Substrates; Temperature;
Conference_Titel :
Solid State Device Research Conference, 1988. ESSDERC '88. 18th European
Conference_Location :
Montpellier, France
