DocumentCode
1943482
Title
Theoretical Analysis of the Two-Terminal MOS Capacitor on SOI Substrate
Author
Paelinck, P. ; Flandre, D. ; Terao, A. ; van de Wiele, F.
Author_Institution
Laboratoire de Microelectronique, Université Catholique de Louvain, Place du Levant 3, B-1348 Louvain-la-Neuve, Belgium
fYear
1988
fDate
13-16 Sept. 1988
Abstract
The present paper deals with the analytical and numerical study of MOS capacitors on SOI substrates. The major concern is the theoretical treatment of such devices with floating substrate. Special care has been taken to keep the mathematical modeling consistent with physical considerations. The importance and the role of the underlying silicon substrate have been highlighted. The different operating conditions of the capacitance-voltage characteristic have been interpreted in terms of device intrinsic physical mechanisms.
Keywords
Analytical models; Capacitance-voltage characteristics; Insulation; MOS capacitors; Parasitic capacitance; Poisson equations; Semiconductor process modeling; Silicon on insulator technology; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1988. ESSDERC '88. 18th European
Conference_Location
Montpellier, France
Print_ISBN
2868830994
Type
conf
Filename
5436857
Link To Document