• DocumentCode
    1943482
  • Title

    Theoretical Analysis of the Two-Terminal MOS Capacitor on SOI Substrate

  • Author

    Paelinck, P. ; Flandre, D. ; Terao, A. ; van de Wiele, F.

  • Author_Institution
    Laboratoire de Microelectronique, Université Catholique de Louvain, Place du Levant 3, B-1348 Louvain-la-Neuve, Belgium
  • fYear
    1988
  • fDate
    13-16 Sept. 1988
  • Abstract
    The present paper deals with the analytical and numerical study of MOS capacitors on SOI substrates. The major concern is the theoretical treatment of such devices with floating substrate. Special care has been taken to keep the mathematical modeling consistent with physical considerations. The importance and the role of the underlying silicon substrate have been highlighted. The different operating conditions of the capacitance-voltage characteristic have been interpreted in terms of device intrinsic physical mechanisms.
  • Keywords
    Analytical models; Capacitance-voltage characteristics; Insulation; MOS capacitors; Parasitic capacitance; Poisson equations; Semiconductor process modeling; Silicon on insulator technology; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1988. ESSDERC '88. 18th European
  • Conference_Location
    Montpellier, France
  • Print_ISBN
    2868830994
  • Type

    conf

  • Filename
    5436857