Title :
Open Stencil Masks for Ion Projection Lithography
Author :
Buchmann, L.M. ; Csepregi, L. ; Moller, P.
Author_Institution :
Fraunhofer-Institut fÿr Mikrostrukturtechnik, Dillenburger Str. 53, D 1000 Berlin 33, West Germany
Abstract :
A processing scheme for the manufacturing of an open stencil mask has been set up by application of silicon technology and only one single X-ray lithography step for pattern generation. The mask fabrication is fully adapted to the demands of an ion projection lithography equipment by IMS. It has been proved that this mask technology permits solid structures of a complex geometry with high pattern fidelity.
Keywords :
Biomembranes; Boron; CMOS technology; Etching; Geometry; Resists; Silicon; Sulfur hexafluoride; Thermal stresses; X-ray lithography;
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
