DocumentCode :
1943997
Title :
Diode cascade quantum well VCSEL
Author :
Ebeling, K.J. ; Grabherr, M. ; Jager, R. ; Michalzik, R.
Author_Institution :
Dept. of Optoelectron., Ulm Univ., Germany
fYear :
1997
fDate :
11-13 Aug. 1997
Firstpage :
61
Lastpage :
62
Abstract :
Summary form only. In the present study we investigate diode cascade structures containing two active InGaAs quantum well layer VCSELs connected by a modulation doped backward tunnel diode. This approach of applying several diodes in series may potentially lead to a threshold current close to the transparency current and provide high differential gain but requires an enlarged operating voltage depending on the number of pn-junctions employed.
Keywords :
III-V semiconductors; distributed Bragg reflector lasers; gallium arsenide; indium compounds; laser cavity resonators; molecular beam epitaxial growth; p-n junctions; quantum well lasers; semiconductor doping; semiconductor growth; surface emitting lasers; tunnel diodes; InGaAs; active InGaAs quantum well layer VCSELs; diode cascade quantum well VCSEL; diode cascade structures; enlarged operating voltage; high differential gain; modulation doped backward tunnel diode; pn-junctions; threshold current; transparency current; Charge carrier processes; Diodes; Epitaxial layers; Mirrors; Power generation; Quantum cascade lasers; Radiative recombination; Threshold current; Threshold voltage; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
Conference_Location :
Montreal, Que., Canada
Print_ISBN :
0-7803-3891-X
Type :
conf
DOI :
10.1109/LEOSST.1997.619105
Filename :
619105
Link To Document :
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