DocumentCode
1944027
Title
Atomistic Simulation of Band-to-Band Tunneling in III-V Nanowire Field-Effect Transistors
Author
Basu, Dipanjan ; Register, Leonard F. ; Gilbert, Matthew J. ; Banerjee, Sanjay K.
Author_Institution
Microelectron. Res. Center, Univ. of Texas at Austin, Austin, TX, USA
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
1
Lastpage
4
Abstract
Efficient atomistic simulators are required for full band treatments in strongly quantum confined systems, and for simulation of transport in emerging materials and devices such as graphene. Here we present an efficient transmission matrix based approach to ballistic quantum transport calculation for full three-dimensional, nearest-neighbor tight-binding based atomistic simulations. The method is then used to demonstrate how band-to-band tunneling increases the leakage current in OFF state in field-effect transistors with low band gap semiconductors such as InSb as channel material.
Keywords
III-V semiconductors; field effect transistors; nanowires; III-V nanowire field-effect transistors; atomistic simulation; ballistic quantum transport calculation; band-to-band tunneling; nearest-neighbor tight-binding based-atomistic simulations; quantum confined systems; transmission matrix; Atomic layer deposition; Atomic measurements; Crystalline materials; FETs; III-V semiconductor materials; Microelectronics; Nanotechnology; Photonic band gap; Potential well; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location
San Diego, CA
ISSN
1946-1569
Print_ISBN
978-1-4244-3974-8
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2009.5290220
Filename
5290220
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