• DocumentCode
    1944027
  • Title

    Atomistic Simulation of Band-to-Band Tunneling in III-V Nanowire Field-Effect Transistors

  • Author

    Basu, Dipanjan ; Register, Leonard F. ; Gilbert, Matthew J. ; Banerjee, Sanjay K.

  • Author_Institution
    Microelectron. Res. Center, Univ. of Texas at Austin, Austin, TX, USA
  • fYear
    2009
  • fDate
    9-11 Sept. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Efficient atomistic simulators are required for full band treatments in strongly quantum confined systems, and for simulation of transport in emerging materials and devices such as graphene. Here we present an efficient transmission matrix based approach to ballistic quantum transport calculation for full three-dimensional, nearest-neighbor tight-binding based atomistic simulations. The method is then used to demonstrate how band-to-band tunneling increases the leakage current in OFF state in field-effect transistors with low band gap semiconductors such as InSb as channel material.
  • Keywords
    III-V semiconductors; field effect transistors; nanowires; III-V nanowire field-effect transistors; atomistic simulation; ballistic quantum transport calculation; band-to-band tunneling; nearest-neighbor tight-binding based-atomistic simulations; quantum confined systems; transmission matrix; Atomic layer deposition; Atomic measurements; Crystalline materials; FETs; III-V semiconductor materials; Microelectronics; Nanotechnology; Photonic band gap; Potential well; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-3974-8
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2009.5290220
  • Filename
    5290220