• DocumentCode
    1944054
  • Title

    A Fast Void Detection Algorithm for Three-Dimensional Deposition Simulation

  • Author

    Ertl, Otmar ; Selberherr, Siegfried

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2009
  • fDate
    9-11 Sept. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We present an efficient algorithm for the detection of voids which potentially emerge during deposition process simulation. The application of modern level set techniques and data structures enables the fast determination of connected components directly from the implicit level set representation without the need of an additional surface extraction. The algorithm exhibits optimal linear scaling with surface size and is demonstrated on an example, where an isotropic etching process followed by conformal deposition is simulated.
  • Keywords
    data structures; etching; conformal deposition; data structures; deposition process simulation; fast void detection algorithm; isotropic etching process; optimal linear scaling; surface extraction; three-dimensional deposition simulation; Area measurement; Computational modeling; Data structures; Detection algorithms; Difference equations; Finite difference methods; Level set; Microelectronics; Narrowband; Surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-3974-8
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2009.5290221
  • Filename
    5290221