Title :
A new measurement system with a virtual gray level pattern
Author :
Yeh-fen Fu ; Lih-horng Shyu
Author_Institution :
Dept. of Manage. Inf. Sci., Chung Kuo Inst. of Technol. & Commerce, Taipei, Taiwan
Abstract :
In this paper, an equivalent gray level pattern with a small period has been proposed, based on the concept of geometrical variety and associated with the manufacturing process of a semiconductor optical mask. High precision displacement measurement is achieved by a phase-detecting technology. The experimental results show that the concept is feasible.
Keywords :
CCD image sensors; Gray codes; displacement measurement; image processing equipment; masks; CCD camera; binary optical mask; charge injection sensor; displacement measurement; equivalent gray level pattern; geometrical variety; gray coding pattern; phase-detecting technology; semiconductor optical mask manufacturing process; virtual gray level pattern measurement; Charge coupled devices; Detectors; Geometrical optics; Information management; Lenses; Object detection; Printers; Semiconductor device manufacture; Sensor arrays; Signal processing;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
DOI :
10.1109/CLEOPR.2001.967931
