DocumentCode
1944687
Title
GaSb and GaInAsSb Photodetectors for λ ≫ 1.55 μm Prepared by Metal Organic Chemical Vapor Deposition
Author
Bougnot, G. ; Pascal, F. ; Roumanille, F. ; Bougnot, J. ; Gouskov, L. ; Delannoy, F. ; Grosse, P. ; Luquet, H.
Author_Institution
Centre d´´Electronique de Montpellier (CNRS-UA 391), Universit? des Sciences et Techniques du Languedoc, Place Eug?ne Bataillon, F-34060 Montpellier Cedex, France
fYear
1988
fDate
13-16 Sept. 1988
Abstract
p and n GaSb layers have been grown on GaSb and semi-insulating GaAs substrates by Metal Organic Chemical Vapor Deposition (MOCVD) method ; the lowest doping levels obtained are: p = 2 Ã 1016cm-3, n = 8 Ã 1015cm-3. P type Ga1-x inx Asy Sb1-y layers have also been fabricated by MOCVD with a composition insuring the photodetection at a wavelength of 2.5μm. The properties of the layers and of the as grown junctions are described.
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1988. ESSDERC '88. 18th European
Conference_Location
Montpellier, France
Print_ISBN
2868830994
Type
conf
Filename
5436912
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