DocumentCode :
1944826
Title :
Thermal Oxidation Kinetics and Locos Isolation in Soi Materials
Author :
Crowder, Scott ; Griffin, P. ; Plummer, J.D.
Author_Institution :
Stanford University, CA
fYear :
1992
fDate :
6-8 Oct. 1992
Firstpage :
24
Lastpage :
25
Keywords :
Analytical models; Capacitance measurement; Electric variables measurement; Implants; Kinetic theory; Leakage current; Optical films; Oxidation; Reflectivity; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1992. IEEE International
Conference_Location :
Ponte Vedra Beach, FL
ISSN :
1078-621X
Print_ISBN :
0-7803-7439-8
Type :
conf
DOI :
10.1109/SOI.1992.664777
Filename :
664777
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1944826
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