DocumentCode
1945600
Title
Fabrication of the planar angular rotator using the CMOS process
Author
Chen, Hunrzlin ; Chang, Chienliu ; Yen, Kaihsiang ; Huang, Huiwen ; Chio, Jinhung ; Wu, Chingyi ; Chang, Peizen
Author_Institution
Microsyst. Lab., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear
2000
fDate
23-27 Jan 2000
Firstpage
17
Lastpage
22
Abstract
This investigation proposes a novel planar angular rotator fabricated by the conventional CMOS process. Following the 0.6 μm SPTM (single poly triple metal) CMOS process, the device is completed by a simple post-process with maskless etching. The suspension unit rotates around its geometric center with electrostatic actuation. In addition to having a single rotatory component, 2×2 and 3×3 arrayed components are designed to have a larger rotatory angle with less actuation distance. The proposed design adopts an intelligent mechanism, including slider-crank and four-bar linkage, to permit simultaneous motion. With driving voltages of around 40 volts, the CMOS planar angular rotator could be driven. Comparing to the most common planar angular, micromotor, the design proposed herein has a shorter response time and longer life without the problems of friction and wear
Keywords
CMOS integrated circuits; micromotors; rotors; 0.6 micron; 40 V; MEMS device; electrostatic actuation; fabrication; four-bar linkage; maskless etching; micromotor; planar angular rotator; single poly triple metal CMOS process; slider-crank mechanism; CMOS process; CMOS technology; Connectors; Electrostatics; Fabrication; Fingers; Friction; Micromechanical devices; Micromotors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location
Miyazaki
ISSN
1084-6999
Print_ISBN
0-7803-5273-4
Type
conf
DOI
10.1109/MEMSYS.2000.838483
Filename
838483
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