DocumentCode :
1945600
Title :
Fabrication of the planar angular rotator using the CMOS process
Author :
Chen, Hunrzlin ; Chang, Chienliu ; Yen, Kaihsiang ; Huang, Huiwen ; Chio, Jinhung ; Wu, Chingyi ; Chang, Peizen
Author_Institution :
Microsyst. Lab., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear :
2000
fDate :
23-27 Jan 2000
Firstpage :
17
Lastpage :
22
Abstract :
This investigation proposes a novel planar angular rotator fabricated by the conventional CMOS process. Following the 0.6 μm SPTM (single poly triple metal) CMOS process, the device is completed by a simple post-process with maskless etching. The suspension unit rotates around its geometric center with electrostatic actuation. In addition to having a single rotatory component, 2×2 and 3×3 arrayed components are designed to have a larger rotatory angle with less actuation distance. The proposed design adopts an intelligent mechanism, including slider-crank and four-bar linkage, to permit simultaneous motion. With driving voltages of around 40 volts, the CMOS planar angular rotator could be driven. Comparing to the most common planar angular, micromotor, the design proposed herein has a shorter response time and longer life without the problems of friction and wear
Keywords :
CMOS integrated circuits; micromotors; rotors; 0.6 micron; 40 V; MEMS device; electrostatic actuation; fabrication; four-bar linkage; maskless etching; micromotor; planar angular rotator; single poly triple metal CMOS process; slider-crank mechanism; CMOS process; CMOS technology; Connectors; Electrostatics; Fabrication; Fingers; Friction; Micromechanical devices; Micromotors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
ISSN :
1084-6999
Print_ISBN :
0-7803-5273-4
Type :
conf
DOI :
10.1109/MEMSYS.2000.838483
Filename :
838483
Link To Document :
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