Title :
N-well based CMOS calorimetric chemical sensors
Author :
Kerness, N. ; Koll, A. ; Schaufelbühl, A. ; Hagleitner, C. ; Hierlemann, A. ; Brand, O. ; Baltes, H.
Author_Institution :
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
Abstract :
New micromachined calorimetric chemical sensors based on an n-well island structure have been designed, fabricated in industrial CMOS technology, and tested. The suspended island structure is covered with a polymer and changes its temperature upon absorption or desorption of analyte. The temperature change is recorded by integrated polysilicon/aluminum thermopiles. A polysilicon or metal heating resistor covers the n-well structure which allows a more accurate calibration compared to our previous design . The system provides a physical sensitivity of 34 and 26.5 mV/μW for the square and rectangular shaped membrane devices, respectively. Sensitivity and performance of the calorimetric chemical microsystem are shown by measurements for different volatile organic compounds. The system has a sensitivity of 0.045 and 0.049 mV/ppm to ethanol and 0.209 and 0.229 mV/ppm to toluene for the square and rectangular membrane devices, respectively
Keywords :
CMOS integrated circuits; calorimeters; chemical sensors; micromachining; microsensors; CMOS technology; calibration; calorimetric chemical sensor; ethanol; heating resistor; integrated polysilicon/aluminum thermopile; membrane device; micromachining; n-well island structure; toluene; volatile organic compound; Absorption; Biomembranes; CMOS technology; Chemical industry; Chemical sensors; Chemical technology; Polymers; Temperature sensors; Testing; Textile industry;
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
Print_ISBN :
0-7803-5273-4
DOI :
10.1109/MEMSYS.2000.838497