• DocumentCode
    1946163
  • Title

    Synthesizing high-performance compliant stroke amplification systems for MEMS

  • Author

    Kota, Sridhar ; Hetrick, Joel ; Li, Zhe ; Rodgers, Steve ; Krygowski, Thomas

  • Author_Institution
    Michigan Univ., Ann Arbor, MI, USA
  • fYear
    2000
  • fDate
    23-27 Jan 2000
  • Firstpage
    164
  • Lastpage
    169
  • Abstract
    We have recently designed, fabricated, demonstrated a new class of compliant stroke amplification mechanisms that are exceptionally well suited for MEMS applications. Manufactured in Sandia´s advanced 5-level surface micromachining technology known as SUMMiT-V, these computer generated structures provide high work and area efficiency in designs that are highly compatible with the fabrication process. The actual devices display outstanding yield, robustness, endurance, and resistance to surface adhesion effects during the final release process. One device has been driven to a 20-μm output displacement at resonance for more than 1010 cycles with no apparent fatigue. This paper focuses on the unique methodology employed to design and analyze these compliant stroke amplification systems. The same approach, however, can be used to design many other compliant structures for fabrication in a MEMS technology. Compliance in design leads to creation of jointless, no-assembly, monolithic mechanical device
  • Keywords
    compliance control; flexible structures; microactuators; micromachining; technology CAD (electronics); MEMS application; MEMS multiplier; SUMMiT-V; advanced 5-level surface micromachining; compliant stroke amplification mechanisms; computer generated structures; design; endurance; fabrication; final release process; flexural links; high-performance systems; no-assembly monolithic mechanical device; robustness; surface adhesion effects; topology synthesis; yield; Adhesives; Application software; Computer aided manufacturing; Computer displays; Fabrication; Manufacturing processes; Micromachining; Micromechanical devices; Robustness; Surface resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
  • Conference_Location
    Miyazaki
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-5273-4
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2000.838509
  • Filename
    838509