Measurement of characteristics of nanometric mechanical oscillators

Author

Fukushima, K. ; Saya, D. ; Toshiyoshi, H. ; Fujita, H. ; Hashiguchi, G. ; Kawakatsu, H.

Author_Institution

Inst. of Ind. Sci., Tokyo Univ., Japan

fYear

2000

fDate

23-27 Jan 2000

Firstpage

211

Lastpage

216

Abstract

For the purpose of making a small probe for scanning force microscopy (SFM), we have succeeded in fabricating nanometric oscillators with a tip mass of silicon and a neck of silicon dioxide by micromachining Si-SiO₂-Si laminated substrates. The size of the head ranged from 100 nm to 3 μm and the diameter of the neck range from 10 nm to 200 nm. The resonant frequency is calculated to be in MHz order. Results of the test done by an atomic force microscope built within a scanning electron microscope showed that the oscillators are elastic and strong enough for use as SFM cantilevers

Keywords

atomic force microscopy; characteristics measurement; elemental semiconductors; mechanical strength; mechanical variables measurement; micromachining; micromechanical devices; oscillators; scanning electron microscopes; silicon; silicon-on-insulator; 10 to 200 nm; 100 nm to 3 mum; SFM cantilevers; Si-SiO₂-Si; Si-SiO₂-Si laminated substrates; atomic force microscope; micromachining; nanometric mechanical oscillators; resonant frequency; scanning electron microscope; tip mass; Atomic force microscopy; Mechanical variables measurement; Micromachining; Neck; Oscillators; Probes; Resonant frequency; Scanning electron microscopy; Silicon compounds; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on

Conference_Location

Miyazaki

ISSN

1084-6999

Print_ISBN

0-7803-5273-4

Type

conf

DOI

10.1109/MEMSYS.2000.838518

Filename

838518