Title :
Statistical Analysis of Silicon Defect Densities in Simox
Author :
Allen, L.P. ; Genis, A. ; Krull, W.
Author_Institution :
Ibis Technology Corporation, Danvers, MA
Keywords :
Analysis of variance; Chemicals; Circuits; Density measurement; Etching; Implants; Raman scattering; Silicon; Statistical analysis; X-ray diffraction;
Conference_Titel :
SOI Conference, 1992. IEEE International
Conference_Location :
Ponte Vedra Beach, FL
Print_ISBN :
0-7803-7439-8
DOI :
10.1109/SOI.1992.664786
