• DocumentCode
    1946909
  • Title

    Novel wafer-level CSP for stacked MEMS / IC dies with hermetic sealing

  • Author

    Sugizaki, Yoshiaki ; Nakao, Mitsuhiro ; Higuchi, Kazuhito ; Miyagi, Takeshi ; Obata, Susumu ; Inoue, Michinobu ; Endo, Mitsuyoshi ; Shimooka, Yoshiaki ; Kojima, Akihiro ; Mori, Ikuo ; Shibata, Hideki

  • Author_Institution
    Center for Semicond. R&D, Toshiba Corp., Kawasaki
  • fYear
    2008
  • fDate
    27-30 May 2008
  • Firstpage
    811
  • Lastpage
    816
  • Abstract
    Novel wafer-level chip scale package (WL-CSP) applicable to configurations involving stacking of multiple dies has been developed. Since stacked die makes high topography and it is difficult to apply conventional WL-CSP process, gold bonding wires were used for not only connecting stacked dies with one another but also for connecting from each die to CSP terminals. The WL-CSP is also applicable to microelecrromechanical system (MEMS) that requires hermetic sealing. Thin-film encapsulation for MEMS was formed by conventional back end of line (BEOL) process. Followed by die stacking and gold wire forming, chemical vapor deposition (CVD) was applied to make hermetic sealing. The WL-CSP does not require photolithography process on topography wafer. It promises a cost-effective solution for MEMS/IC dies coupled device.
  • Keywords
    chemical vapour deposition; encapsulation; hermetic seals; micromechanical devices; thin films; wafer level packaging; MEMS-IC dies coupled device; back end of line; chemical vapor deposition; gold bonding wires; hermetic sealing; microelecrromechanical system; stacked MEMS-IC dies; thin-film encapsulation; topography wafer; wafer-level chip scale package; Chip scale packaging; Gold; Joining processes; Micromechanical devices; Stacking; Surfaces; Transistors; Wafer bonding; Wafer scale integration; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-2230-2
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2008.4550068
  • Filename
    4550068