DocumentCode :
1947098
Title :
Atomic Force Microscopy As a Technique for Simox Material Inspection and Process Characterization
Author :
Netherton, S.W. ; Tyson, S.M. ; Matia, G. ; Tanski, William ; Carroll, Roger
Author_Institution :
United Technologies Microelectronics Center, Colorado
fYear :
1992
fDate :
6-8 Oct. 1992
Firstpage :
48
Lastpage :
49
Keywords :
Atomic force microscopy; Atomic measurements; Density measurement; Etching; Inspection; Plasma applications; Plasma density; Rough surfaces; Silicon; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1992. IEEE International
Conference_Location :
Ponte Vedra Beach, FL
ISSN :
1078-621X
Print_ISBN :
0-7803-7439-8
Type :
conf
DOI :
10.1109/SOI.1992.664788
Filename :
664788
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1947098
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