• DocumentCode
    1947190
  • Title

    Reliability testing of through-silicon vias for high-current 3D applications

  • Author

    Wright, Steven L. ; Andry, Paul S. ; Sprogis, Edmund ; Dang, Bing ; Polastre, Robert J.

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights, NY
  • fYear
    2008
  • fDate
    27-30 May 2008
  • Firstpage
    879
  • Lastpage
    883
  • Abstract
    A robust through-silicon via technology is necessary for high-power, high-performance 3D-silicon applications. To study through-via interconnection reliability, modules consisting of a test chip, silicon carrier interposer with through-vias, and ceramic substrate were constructed. A socket assembly containing a microchannel water cooler was also constructed to apply pulsed power to via daisy chain test sites. Test results to date indicate that the interconnection reliability is limited by the solder bump portions of the interconnection, not the through-silicon via itself.
  • Keywords
    interconnections; reliability; solders; high-current 3D applications; interconnection reliability; pulsed power; reliability testing; solder bump portions; through-silicon vias; Assembly; Ceramics; Circuit testing; Electromigration; Packaging; Probes; Silicon; Sockets; Thermal stresses; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-2230-2
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2008.4550080
  • Filename
    4550080