DocumentCode
1947190
Title
Reliability testing of through-silicon vias for high-current 3D applications
Author
Wright, Steven L. ; Andry, Paul S. ; Sprogis, Edmund ; Dang, Bing ; Polastre, Robert J.
Author_Institution
IBM T.J. Watson Res. Center, Yorktown Heights, NY
fYear
2008
fDate
27-30 May 2008
Firstpage
879
Lastpage
883
Abstract
A robust through-silicon via technology is necessary for high-power, high-performance 3D-silicon applications. To study through-via interconnection reliability, modules consisting of a test chip, silicon carrier interposer with through-vias, and ceramic substrate were constructed. A socket assembly containing a microchannel water cooler was also constructed to apply pulsed power to via daisy chain test sites. Test results to date indicate that the interconnection reliability is limited by the solder bump portions of the interconnection, not the through-silicon via itself.
Keywords
interconnections; reliability; solders; high-current 3D applications; interconnection reliability; pulsed power; reliability testing; solder bump portions; through-silicon vias; Assembly; Ceramics; Circuit testing; Electromigration; Packaging; Probes; Silicon; Sockets; Thermal stresses; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
978-1-4244-2230-2
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2008.4550080
Filename
4550080
Link To Document