DocumentCode :
1947201
Title :
Assessment of electro-static discharge robustness based on the monitoring of lattice temperature of silicon
Author :
Yoo, Kwang D. ; Lim, Gwang H. ; Jin, Joo H. ; Choi, Kyu H.
Author_Institution :
Semicond. R&D, Samsung Electron., Kyunggi, South Korea
fYear :
1994
fDate :
22-25 Mar 1994
Firstpage :
208
Lastpage :
213
Abstract :
In this paper, we demonstrate that it is possible to develop an optimum ESD protection device by comparing the relative ESD robustness of each device, based on the monitoring of the peak temperature correlated with the peak power density. The methodology, supported by measurement data, could give an extra degree of freedom to IC designers confronted with the troublesome ESD phenomenon
Keywords :
MOS integrated circuits; electrostatic discharge; integrated circuit technology; integrated circuit testing; protection; silicon; temperature distribution; IC design; Si; electrostatic discharge robustness; lattice temperature; optimum ESD protection device; peak power density; peak temperature; Biological system modeling; Circuit simulation; Electrostatic discharge; Lattices; Monitoring; Protection; Robustness; Silicon; Temperature measurement; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-1757-2
Type :
conf
DOI :
10.1109/ICMTS.1994.303474
Filename :
303474
Link To Document :
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