Single crystal silicon (SCS) micromirror arrays using deep silicon etching and IR alignment

Author

Lee, Chris S B ; Webb, Russell Y. ; Chong, John M. ; MacDonald, Noel C.

Author_Institution

Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA

fYear

2000

fDate

23-27 Jan 2000

Firstpage

441

Lastpage

448

Abstract

10×10 and 5×5, a high mirror fill factor (>70%), low voltage operation (<30 V), single crystal silicon (SCS) micromirror arrays have been designed, fabricated, and tested. Each mirror is 320 μm by 170 μm and is individually addressable. In comparison to thin film micro-mirror arrays, the SCS mirror surface is optically flat and smooth, free of residual stress, and highly reflective after the deposition of a thin aluminum layer. In addition to a flat mirror, high-aspect-ratio grating structures have been fabricated on the surface of the mirrors, enhancing the optical manipulation potential of devices

Keywords

elemental semiconductors; etching; internal stresses; masks; micro-optics; microactuators; mirrors; optical arrays; optical fabrication; silicon; 170 micron; 30 V; 320 micron; IR alignment; Si; deep etching; high-aspect-ratio grating structures; low voltage operation; micromirror arrays; mirror fill factor; optical manipulation potential; residual stress; Aluminum; Low voltage; Micromirrors; Mirrors; Optical arrays; Optical films; Residual stresses; Silicon; Sputtering; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on

Conference_Location

Miyazaki

ISSN

1084-6999

Print_ISBN

0-7803-5273-4

Type

conf

DOI

10.1109/MEMSYS.2000.838558

Filename

838558