DocumentCode
1948005
Title
Rigorous Three-Dimensional Photolithography Simulation over Nonplanar Structures
Author
Kirchauer, H. ; Selberherr, S.
Author_Institution
Institute for Microelectronics, TU Vienna, Gusshausstrasse 27-29, A-1040 Vienna, Austria. E-mail kirchauer@iue.tuwien.ac.at
fYear
1996
fDate
9-11 Sept. 1996
Firstpage
347
Lastpage
350
Abstract
A rigorous three-dimensional simulation method for nonplanar substrate lithography is presented. The light propagation within the photoresist is calculated using the Maxwell equations. Our method relies on a Fourier expansion of the electromagnetic field and extends the two-dimensional differential method [1][2].
Keywords
Electromagnetic coupling; Electromagnetic propagation; Geometry; Lithography; Maxwell equations; Microelectronics; Partial differential equations; Permittivity; Resists; Symmetric matrices;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Conference_Location
Bologna, Italy
Print_ISBN
286332196X
Type
conf
Filename
5437071
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