DocumentCode

1948099

Title

Mainstreaming of SOI Technology

Author

Shahidi, Ghavam G.

Author_Institution

IBM Microelectronics Division, Hopewell Junction, NY, USA

Volume

1

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

3

Lastpage

10

Keywords

CMOS process; CMOS technology; Digital circuits; History; Impact ionization; Isolation technology; Manufacturing; Process design; Substrates; Thickness control;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

conf

Filename

1505442