Title :
Mainstreaming of SOI Technology
Author :
Shahidi, Ghavam G.
Author_Institution :
IBM Microelectronics Division, Hopewell Junction, NY, USA
Keywords :
CMOS process; CMOS technology; Digital circuits; History; Impact ionization; Isolation technology; Manufacturing; Process design; Substrates; Thickness control;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
