DocumentCode :
1948287
Title :
Fabrication, simulation and experiment of a rotating electrostatic silicon mirror with large angular deflection
Author :
Camon, Henri
Author_Institution :
Lab. d´Anal. et d´Archit. des Syst., CNRS, Toulouse
fYear :
2000
fDate :
23-27 Jan 2000
Firstpage :
645
Lastpage :
650
Abstract :
We propose in this paper the complete study of a bulk micromachined silicon micromirror able to tilt up to ±20° at a relatively high frequency (1 kHz). These structures actuated with particular electrodes could be also used as a digital micromirror up to 35°. Their behaviours have been tested in term of static and frequency responses. A non-linear phenomenon has been observed at very large angle. The pressure dependence of the quality factor of the microstructure is reported. Lifetime aspect has also been tested
Keywords :
Q-factor; electrostatic devices; elemental semiconductors; frequency response; life testing; micro-optics; micromachining; mirrors; semiconductor device testing; silicon; 1 kHz; Si; Si bulk micromachined micromirror; angular deflection; damping; digital micromirror; frequency response; lifetime; nonlinear phenomenon; packaging; pressure dependence; quality factor; reliability; rotating electrostatic silicon mirror; simulation; static response; Electrodes; Electrostatics; Fabrication; Laser beams; Micromirrors; Microstructure; Mirrors; Silicon; Torque; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
ISSN :
1084-6999
Print_ISBN :
0-7803-5273-4
Type :
conf
DOI :
10.1109/MEMSYS.2000.838594
Filename :
838594
Link To Document :
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