Technology investigation on developing fit garment patterns with different size in 2D and 3D CAD system

In order to customize different size garment patterns, several methods in computer aided design system can be adopted. Traditional grading technology in 2D CAD and new parametrical body modeling technology in 3D CAD were introduced in the paper. The main grading methods include point grading, rule table grading, cut-line grading and parametric grading. The principles and characteristics of these methods were outlined combined with a typical 2D system (Richpeace) in the Chinese market. In 3D system, mannequin or garment parametrical modeling is most important precondition for developing individual garment patterns. Several novel researches about parameterization approach are reviewed. Finally, a pattern customizing case on a fit pants with four different size was implemented based on 3D modeling technology.