A novel bi-directional magnetic microactuator using electroplated permanent magnet arrays with vertical anisotropy

Author

Cho, Hyoung J. ; Ahn, Chong H.

Author_Institution

Dept. of Electr. & Comput. Eng. & Comput. Sci., Cincinnati Univ., OH, USA

fYear

2000

fDate

23-27 Jan 2000

Firstpage

686

Lastpage

691

Abstract

A novel bi-directional magnetic microactuator using electroplated permanent magnet arrays has been fabricated and tested in this work. To realize the microactuator, a new electroplating technique has been developed to improve vertical magnetic anisotropy in CoNiMnP-based permanent magnet arrays. By applying magnetic field during electroplating, vertical coercivity and remanence have been increased up to 1100 Oe and 1900 G. After electroplating the magnet arrays at the tip of a prototype silicon cantilever beam, bi-directional magnetic actuation has been successfully achieved by exciting an integrated electromagnet under the beam

Keywords

arrays; cobalt alloys; coercive force; electromagnetic actuators; electroplating; magnetic anisotropy; manganese alloys; microactuators; nickel alloys; permanent magnets; phosphorus alloys; remanence; CoNiMnP; CoNiMnP-based magnet; aspect ratio; bidirectional magnetic microactuator; electroplated permanent magnet arrays; electroplating technique; etching; hysteresis loops; integrated electromagnet; optimum plating; prototype silicon cantilever beam; remanence; vertical anisotropy control; vertical coercivity; Bidirectional control; Coercive force; Magnetic anisotropy; Magnetic fields; Microactuators; Micromagnetics; Permanent magnets; Perpendicular magnetic anisotropy; Structural beams; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on

Conference_Location

Miyazaki

ISSN

1084-6999

Print_ISBN

0-7803-5273-4

Type

conf

DOI

10.1109/MEMSYS.2000.838601

Filename

838601