• DocumentCode
    19503
  • Title

    Tunnel Field-Effect Transistors: State-of-the-Art

  • Author

    Hao Lu ; Seabaugh, Alan

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • Volume
    2
  • Issue
    4
  • fYear
    2014
  • fDate
    Jul-14
  • Firstpage
    44
  • Lastpage
    49
  • Abstract
    Progress in the development of tunnel field-effect transistors (TFETs) is reviewed by comparing experimental results and theoretical predictions against 16-nm FinFET CMOS technology. Experiments lag the projections, but sub-threshold swings less than 60 mV/decade are now reported in 14 TFETs. The lowest measured sub-threshold swings approaches 20 mV/decade, however, the measurements at these lowest values are not based on many points. The highest current at which sub-threshold swing below 60 mV/decade is observed is in the range 1-10 nA/μm. A common approach to TFET characterization is proposed to facilitate future comparisons.
  • Keywords
    CMOS integrated circuits; field effect transistors; tunnel transistors; FinFET CMOS technology; band-to-band tunneling; size 16 nm; subthreshold swings; tunnel field effect transistors; Field effect transistors; Indium gallium arsenide; Logic gates; Silicon; Tunneling; Band-to-band tunneling; TFET; sub-threshold swing; tunnel field-effect transistor; tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices Society, IEEE Journal of the
  • Publisher
    ieee
  • ISSN
    2168-6734
  • Type

    jour

  • DOI
    10.1109/JEDS.2014.2326622
  • Filename
    6820751