DocumentCode :
19503
Title :
Tunnel Field-Effect Transistors: State-of-the-Art
Author :
Hao Lu ; Seabaugh, Alan
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
Volume :
2
Issue :
4
fYear :
2014
fDate :
Jul-14
Firstpage :
44
Lastpage :
49
Abstract :
Progress in the development of tunnel field-effect transistors (TFETs) is reviewed by comparing experimental results and theoretical predictions against 16-nm FinFET CMOS technology. Experiments lag the projections, but sub-threshold swings less than 60 mV/decade are now reported in 14 TFETs. The lowest measured sub-threshold swings approaches 20 mV/decade, however, the measurements at these lowest values are not based on many points. The highest current at which sub-threshold swing below 60 mV/decade is observed is in the range 1-10 nA/μm. A common approach to TFET characterization is proposed to facilitate future comparisons.
Keywords :
CMOS integrated circuits; field effect transistors; tunnel transistors; FinFET CMOS technology; band-to-band tunneling; size 16 nm; subthreshold swings; tunnel field effect transistors; Field effect transistors; Indium gallium arsenide; Logic gates; Silicon; Tunneling; Band-to-band tunneling; TFET; sub-threshold swing; tunnel field-effect transistor; tunneling;
fLanguage :
English
Journal_Title :
Electron Devices Society, IEEE Journal of the
Publisher :
ieee
ISSN :
2168-6734
Type :
jour
DOI :
10.1109/JEDS.2014.2326622
Filename :
6820751
Link To Document :
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