1950512

Impact of Electrical Stress on Hot-Electron Injection in Ultra-Thin SiO2 Films

Okhonin, S. ; Berk, Y. ; Ils, A. ; Fazan, P. ; Guegan, G. ; Deleonibus, S. ; Martin, F.

Swiss Federal Institute of Technology, Lausanne, Switzerland

1

1999

13-15 Sept. 1999

588

591

Conductivity; Electron emission; Electron optics; MOS capacitors; Secondary generated hot electron injection; Silicon compounds; Stress; Substrate hot electron injection; Tunneling; Voltage;

English

ieee

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Leuven, Belgium

2-86332-245-1

conf

1505571