• DocumentCode
    1950512
  • Title

    Impact of Electrical Stress on Hot-Electron Injection in Ultra-Thin SiO2 Films

  • Author

    Okhonin, S. ; Berk, Y. ; Ils, A. ; Fazan, P. ; Guegan, G. ; Deleonibus, S. ; Martin, F.

  • Author_Institution
    Swiss Federal Institute of Technology, Lausanne, Switzerland
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    588
  • Lastpage
    591
  • Keywords
    Conductivity; Electron emission; Electron optics; MOS capacitors; Secondary generated hot electron injection; Silicon compounds; Stress; Substrate hot electron injection; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505571
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1950512