• DocumentCode
    1951186
  • Title

    Development of a high brightness, ohmically generated thin film lithium ion source

  • Author

    Menge, P.R. ; Cuneo, M.E. ; Bernard, M.A. ; Fowler, W.E.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    336
  • Abstract
    Summary form only given. A pure lithium ion source with low source divergence capable of generating high current density beams (/spl ap/1000 A/cm/sup 2/) is required for pursuing the goal of light ion inertial confinement fusion using pulsed power. It is believed that a uniform fully ionized lithium plasma at the anode surface (/spl ap/100 cm/sup 2/) created just before arrival of the main power pulse (5-30 MV, 0.1-1 MA, 40-60 ns) will be superior to flashover or field-threshold lithium sources. One method being pursued at Sandia is the development of an ohmically driven thin film lithium source, often termed EMFAPS. The EMFAPS process consists of an electrical pulse driven through a thin film coated with or bearing lithium in alloy or compound. The high current flowing through the film increases its temperature and resistivity until the lithium is driven off as vapor. The resistive voltage drop across the film generates a plasma by a gas discharge. Low impedance, fast risetime pulsers provided by NRL (D.D. Hinshelwood) and Pulse Sciences Inc. are being assembled and evaluated as film current drivers for full scale anodes (/spl ap/70 cm/sup 2/). Smaller scale (/spl ap/1 cm/sup 2/) tests are underway to optimize film composition, current contact engineering, anode construction, impedance dynamics, and energy disposition. Plasma discharge cleaning, bakeouts, film design and material selection issues are also being characterized to improve ion purity.
  • Keywords
    discharges (electric); ion sources; lithium; metallic thin films; plasma inertial confinement; plasma production; plasma temperature; 0.1 to 1 MA; 5 to 30 MV; EMFAPS; Li; anode construction; anode surface; current contact engineering; electrical pulse; energy disposition; fast risetime pulsers; field-threshold lithium sources; film composition; flashover; gas discharge; high brightness ohmically generated thin film Li ion source; high current density beams; high current flow; impedance dynamics; ion purity; light ion inertial confinement fusion; low impedance; low source divergence; material selection issues; plasma discharge cleaning; pulsed power; resistive voltage drop; resistivity; temperature; Anodes; Brightness; Fusion power generation; Impedance; Ion sources; Lithium; Plasma temperature; Power generation; Pulse generation; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.605260
  • Filename
    605260