DocumentCode :
1951989
Title :
Design of high-speed gates based on heterostructural technology
Author :
Tchakhnakia, Z. ; Sikmashvili, Iraklii ; Didebashvili, G. ; Melkadze, Revaz
Author_Institution :
Electron. Technol., Tbilisi State Univ., Georgia
Volume :
2
fYear :
2000
fDate :
2000
Firstpage :
733
Abstract :
The design technique of digital integrated circuits on BFL gates is represented on the basis of an AlGaAs/GaAs heterostructure. The high electron mobility transistor (HEMT) is simulated and the basic architecture and electrophysical parameters of the heterostructure are defined. Experimental samples of the HEMT (with gate length 0.8 μm) on AlGaAs/GaAs heterostructures, manufactured by MBE, are in good agreement with the simulated transistor and the discrepancy does not exceed 10%
Keywords :
HEMT integrated circuits; III-V semiconductors; SPICE; aluminium compounds; field effect logic circuits; gallium arsenide; high-speed integrated circuits; integrated circuit design; logic gates; 0.8 micron; 2DEG; AlGaAs-GaAs; AlGaAs/GaAs heterostructure; BFL gates; I-V characteristics; MBE; SPICE; depletion HEMT; digital integrated circuits; electrophysical parameters; high electron mobility transistor; high-speed gate design; ring oscillator; selectively doped heterostructure; simulated transistor; Contact resistance; Delay effects; Digital integrated circuits; Gallium arsenide; HEMTs; Integrated circuit modeling; Manufacturing; Molecular beam epitaxial growth; SPICE; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-5235-1
Type :
conf
DOI :
10.1109/ICMEL.2000.838794
Filename :
838794
Link To Document :
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