• DocumentCode
    1952032
  • Title

    Surface acoustic wave propagation properties in AlN/3C-SiC/Si composite structure

  • Author

    Lin, Chih-Ming ; Chen, Yung-Yu ; Felmetsger, Valery V. ; Yen, Ting-Ta ; Lien, Wei-Cheng ; Senesky, Debbie G. ; Pisano, Albert P.

  • Author_Institution
    Berkeley Sensor & Actuator Center, Univ. of California at Berkeley, Berkeley, CA, USA
  • fYear
    2010
  • fDate
    11-14 Oct. 2010
  • Firstpage
    1696
  • Lastpage
    1699
  • Abstract
    Highly c-axis oriented aluminum nitride (AIN) films were grown on epitaxial cubic silicon carbide (3C-SiC) layers on Si (100) substrates using alternating current (AC) reactive magnetron sputtering at temperatures between 300 °C to 450 °C. The AIN thin films were characterized by X-ray diffraction, scanning electron microscope, and transmission electron microscopy. Two-port surface acoustic wave (SAW) devices were fabricated on the AIN/3C-SiC/Si layered structure. The SAW propagation properties in the AlN/3C-SiC/Si layered structure were theoretically and experimentally investigated. The Rayleigh mode exhibited a high acoustic velocity of 5,200 m/s due to the epitaxial 3C-SiC layer. The results demonstrate the potential of AIN thin films grown on epitaxial 3C-SiC layers to create piezoelectric acoustic devices for frequency control and harsh environment applications.
  • Keywords
    III-V semiconductors; X-ray diffraction; acoustic wave propagation; aluminium compounds; elemental semiconductors; scanning electron microscopy; semiconductor thin films; silicon; silicon compounds; sputter deposition; transmission electron microscopy; wide band gap semiconductors; AlN-SiC-Si; Si; SiC; X-ray diffraction; alternating current reactive magnetron sputtering; c-axis oriented aluminum nitride films; composite structure; epitaxial cubic silicon carbide; scanning electron microscopy; surface acoustic wave propagation properties; temperature 300 degC to 450 degC; transmission electron microscopy; Epitaxial growth; Silicon; Silicon carbide; Substrates; Surface acoustic wave devices; Surface acoustic waves; Aluminum Nitride; Epitaxial Cubic Silicon Carbide; Green´s Function; Harsh Environment; Surface Acoustic Wave Devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2010 IEEE
  • Conference_Location
    San Diego, CA
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4577-0382-9
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2010.5935478
  • Filename
    5935478