DocumentCode :
1952795
Title :
Electrical properties of super junction p-n diodes fabricated by trench filling
Author :
Yamauchi, Shoichi ; Hattori, Yoshiyuki ; Yamaguchi, Hitoshi
Author_Institution :
Res. Labs., Denso Corp., Aichi, Japan
fYear :
2003
fDate :
14-17 April 2003
Firstpage :
207
Lastpage :
210
Abstract :
We have fabricated Super Junction (SJ) p-n diodes by our previously proposed defect-less trench filling technique with pre- and post-annealing in H2. The trench filling technique has been applied to a comparatively low aspect ratio p/n column structure. Electrical measurements of the SJ p-n diode indicate an increase in breakdown voltage from 70V to 195V due to the multi RESURF effect of the p/n column structure. The leakage current of the diode is below 1x10-7a/cm2 at a reverse bias voltage of 150V. It has been experimentally confirmed that complete depletion occurs when the number of acceptors in the p column is equal to that of donors in the n column.
Keywords :
annealing; electric properties; p-n junctions; semiconductor diodes; 70 to 195 V; H2; annealing; breakdown voltage; electrical property; leakage current; low aspect ratio p/n column structure; multi RESURF effect; reverse bias voltage; super junction p-n diode; trench filling; Boron; Diodes; Doping; Epitaxial growth; Etching; Filling; Human computer interaction; Hydrogen; MOSFETs; P-n junctions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2003. Proceedings. ISPSD '03. 2003 IEEE 15th International Symposium on
Print_ISBN :
0-7803-7876-8
Type :
conf
DOI :
10.1109/ISPSD.2003.1225265
Filename :
1225265
Link To Document :
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