Title :
Reliability of AlN/sapphire bilayer structure for high-temperature SAW applications
Author :
Aubert, Thierry ; Elmazria, Omar ; Assouar, Badreddine ; Hamdan, Ahmad ; Genève, Damien
Author_Institution :
Inst. Jean Lamour, Nancy Univ., Vandoeuvre-les-Nancy, France
Abstract :
This paper explores the possibility to use AIN/sapphire bilayer structure as substrate for surface acoustic wave (SAW) devices operating at high temperature in air atmosphere. Aluminium nitride (AlN) thin films deposited by magnetron sputtering on sapphire substrates were annealed for different periods (2 to 20 hours) and at different temperatures going from 700 to 1000°C. Investigated samples were characterized before and after annealing by X-ray diffraction (XRD), ellipsometry and secondary ion mass spectroscopy (SIMS). This experimental study attests that AIN/Sapphire is reliable up to 700°C in air. These results were also confirmed by in situ measurements of frequency responses coming from SAW devices based on Pt/AIN/Sapphire structure.
Keywords :
X-ray diffraction; aluminium compounds; annealing; ellipsometry; piezoelectric materials; reliability; sapphire; secondary ion mass spectroscopy; semiconductor thin films; sputter deposition; surface acoustic wave sensors; AlN-Al2O3; SAW; SAW sensors; SIMS; X-ray diffraction; XRD; aluminum nitride/sapphire bilayer structure; bilayer structure; ellipsometry; magnetron sputtering; secondary ion mass spectroscopy; surface acoustic wave devices; temperature 700 degC to 1000 degC; time 2 hour to 20 hour; Annealing; Films; Surface acoustic wave devices; Surface acoustic waves; Temperature measurement; Temperature sensors; X-ray scattering; AlN; SAW; high-temperature; sapphire;
Conference_Titel :
Ultrasonics Symposium (IUS), 2010 IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4577-0382-9
DOI :
10.1109/ULTSYM.2010.5935568