• DocumentCode
    1954337
  • Title

    Dependence of Fully Depleted Soimosfet Breakdown Voltage on Film Thickness and Channel Length

  • Author

    Kistler, Neal ; Ver Ploeg, Eric ; Woo, Jason ; Plummer, James

  • Author_Institution
    University of California, Los Angeles
  • fYear
    1992
  • fDate
    6-8 Oct. 1992
  • Firstpage
    128
  • Lastpage
    129
  • Keywords
    Bipolar transistors; Electric variables measurement; Electrical resistance measurement; Impact ionization; Leg; MOSFET circuits; Semiconductor films; Silicon devices; Threshold voltage; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1992. IEEE International
  • Conference_Location
    Ponte Vedra Beach, FL
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-7439-8
  • Type

    conf

  • DOI
    10.1109/SOI.1992.664826
  • Filename
    664826
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1954337