DocumentCode :
1955609
Title :
The analysis and structural design of micro SOI pressure sensors
Author :
Tian, Bian ; Zhao, Yulong ; Jiang, Zhuangde ; Zhang, Ling ; Liao, Nansheng ; Liu, Yuanhao ; Meng, Chao
Author_Institution :
State Key Lab. for Mech. Manuf. Syst., Xi´´an Jiaotong Univ., Xian
fYear :
2009
fDate :
5-8 Jan. 2009
Firstpage :
55
Lastpage :
58
Abstract :
A kind of micro piezoresistive pressure sensor with stable performances under high temperature is designed based on the silicon on insulator (SOI). Through analyzing the stress distribution of diaphragm by finite element method (FEM), the model of structure was established. The fabrication operated on SOI wafer, which can be used in extreme high temperature environments, and applied the technology of anisotropy chemical etching. Performances of this kind of SOI piezoresistive sensor, including size, sensitivity, and temperature were investigated. The result shows that the precision is 0.57% FS. Therefore, this kind of design not only has smaller size, simplicity preparation but also has high sensitivity, temperature coefficient and accuracy.
Keywords :
etching; finite element analysis; microsensors; piezoresistive devices; pressure sensors; silicon-on-insulator; anisotropy chemical etching; finite element method; micro SOI pressure sensors; micro piezoresistive pressure sensor; silicon on insulator; stress distribution; temperature coefficient; Anisotropic magnetoresistance; Chemical technology; Etching; Fabrication; Finite element methods; Piezoresistance; Semiconductor device modeling; Silicon on insulator technology; Stress; Temperature sensors; FEM; High temperature; Pressure; SOI;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4244-4629-2
Electronic_ISBN :
978-1-4244-4630-8
Type :
conf
DOI :
10.1109/NEMS.2009.5068526
Filename :
5068526
Link To Document :
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