• DocumentCode
    1955609
  • Title

    The analysis and structural design of micro SOI pressure sensors

  • Author

    Tian, Bian ; Zhao, Yulong ; Jiang, Zhuangde ; Zhang, Ling ; Liao, Nansheng ; Liu, Yuanhao ; Meng, Chao

  • Author_Institution
    State Key Lab. for Mech. Manuf. Syst., Xi´´an Jiaotong Univ., Xian
  • fYear
    2009
  • fDate
    5-8 Jan. 2009
  • Firstpage
    55
  • Lastpage
    58
  • Abstract
    A kind of micro piezoresistive pressure sensor with stable performances under high temperature is designed based on the silicon on insulator (SOI). Through analyzing the stress distribution of diaphragm by finite element method (FEM), the model of structure was established. The fabrication operated on SOI wafer, which can be used in extreme high temperature environments, and applied the technology of anisotropy chemical etching. Performances of this kind of SOI piezoresistive sensor, including size, sensitivity, and temperature were investigated. The result shows that the precision is 0.57% FS. Therefore, this kind of design not only has smaller size, simplicity preparation but also has high sensitivity, temperature coefficient and accuracy.
  • Keywords
    etching; finite element analysis; microsensors; piezoresistive devices; pressure sensors; silicon-on-insulator; anisotropy chemical etching; finite element method; micro SOI pressure sensors; micro piezoresistive pressure sensor; silicon on insulator; stress distribution; temperature coefficient; Anisotropic magnetoresistance; Chemical technology; Etching; Fabrication; Finite element methods; Piezoresistance; Semiconductor device modeling; Silicon on insulator technology; Stress; Temperature sensors; FEM; High temperature; Pressure; SOI;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
  • Conference_Location
    Shenzhen
  • Print_ISBN
    978-1-4244-4629-2
  • Electronic_ISBN
    978-1-4244-4630-8
  • Type

    conf

  • DOI
    10.1109/NEMS.2009.5068526
  • Filename
    5068526