• DocumentCode
    1955928
  • Title

    SOI-based capacitive micromechanical resonator with submicron gap-spacing

  • Author

    Liu, Yi ; Tang, Yaquan ; Xiaomei Yu

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing
  • fYear
    2009
  • fDate
    5-8 Jan. 2009
  • Firstpage
    130
  • Lastpage
    133
  • Abstract
    MEMS resonators are promising as micromechanical oscillators and filters in wireless communication systems. This paper reports on the fabrication and characterization of single crystal silicon (SCS) disk resonators with sub-micro capacitive gaps. Vertical capacitive gaps as small as 100 nm have been demonstrated in this work. High frequency disk resonators have been implemented and tested.
  • Keywords
    crystal resonators; microfabrication; micromechanical resonators; mobile communication; silicon-on-insulator; SOI; Si-SiO2; capacitive micromechanical resonator; filter; high resonance frequency; micromechanical oscillator; single crystal silicon disk resonator; submicron gap-spacing; vertical capacitive gap; wireless communication system; Driver circuits; Electrodes; Fabrication; Impedance; Micromechanical devices; Optical resonators; Resonance; Resonant frequency; Silicon; Voltage; MEMS; SOI; disk resonator; sub-micro gap;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
  • Conference_Location
    Shenzhen
  • Print_ISBN
    978-1-4244-4629-2
  • Electronic_ISBN
    978-1-4244-4630-8
  • Type

    conf

  • DOI
    10.1109/NEMS.2009.5068542
  • Filename
    5068542