DocumentCode
1955956
Title
Direct bonding SOI Wafer based MEMS cantilever resonator for trace gas sensor applicaiton
Author
Ying, Dong ; Wei, Gao ; Zheng, You
Author_Institution
Dept. of Precision Instrum. & Mechanology, Tsinghua Univ., Beijing
fYear
2009
fDate
5-8 Jan. 2009
Firstpage
134
Lastpage
138
Abstract
A thermal driving and piezoresistive sensing MEMS cantilever resonator has been proposed and developed to construct trace gas detection sensors. The problem of integrating vibration structure, transducers and electric elements is the main concern in the design and fabrication of the resonator. In this paper, the parameters and the configuration of the resonator are discussed, the fabrication process and the test results are presented. Finite Element Analysis (FEA) has been carried out to optimize the configuration of the resonator to obtain high sensitivity and efficiency with a uniform temperature distribution that is propitious to the function of the gas sensing material. The fabrication process is based on direct bonding silicon-on-insulator (SOI) wafer and inductive coupled plasma (ICP) etching technology, which conciliate the semiconductor processes and the micromachining processes, and provide precise control of the resonator parameters. The experimental test results of the fabricated resonator agreed well with the calculation and simulation results and demonstrated that the proposed resonator was qualified to construct trace gas detection sensors.
Keywords
bonding processes; cantilevers; finite element analysis; gas sensors; micromechanical resonators; microsensors; silicon-on-insulator; sputter etching; temperature distribution; FEA; MEMS cantilever resonator fabrication; Si-SiO2; direct bonding SOI wafer based microsensor design; direct bonding silicon-on-insulator wafer; finite element analysis; gas sensing material; inductive coupled plasma etching technology; piezoresistive sensing MEMS; resonator configuration optimization; semiconductor process; thermal driving sensing MEMS; trace gas detection sensor construction; uniform temperature distribution; vibration structure integration; Fabrication; Finite element methods; Gas detectors; Micromechanical devices; Piezoresistance; Silicon on insulator technology; Testing; Thermal sensors; Transducers; Wafer bonding; SOI wafer; cantilever; gas sensor; resonator;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location
Shenzhen
Print_ISBN
978-1-4244-4629-2
Electronic_ISBN
978-1-4244-4630-8
Type
conf
DOI
10.1109/NEMS.2009.5068543
Filename
5068543
Link To Document