Title :
Wafer-level heterointegration process of SAW devices and LSI
Author :
Park, KyeongDong ; Esashi, Masayoshi ; Tanaka, Shuji
Author_Institution :
Dept. of Nanomech., Tohoku Univ., Sendai, Japan
Abstract :
The direct integration of surface acoustic wave (SAW) devices on top of large-scale integrated circuits (LSI) will enable multiband wireless front-ends, one-chip wireless systems, high-performance one-chip oscillators etc. However, this has been difficult, because SAW devices are often fabricated on piezoelectric crystals with special cut angle, which have different coefficients of thermal expansion (CTE) from that of Si. In this paper, wafer-bonding-based integration technology for a one-chip SAW oscillator is described. A SAW resonator with a resonant frequency of 420 MHz fabricated on 128 ° Y cut lithium niobate (LN) was integrated with a BiCMOS oscillator circuit. The key point of the developed process is to avoid thermal expansion mismatch problem between LN and Si. The SAW resonators were supported with a Si wafer in a half-diced form, and then bonded to a LSI wafer by Au-Au bonding. Before the Au-Au bonding, bonding surfaces were activated by Ar plasma to reduce bonding temperature. Finally, the Si support wafer was removed by the sacrificial etching of a Ge interlayer. The developed process can be basically applied to not only SAW devices but also a variety of non-Si devices.
Keywords :
CMOS integrated circuits; etching; large scale integration; lithium compounds; piezoelectric materials; surface acoustic wave oscillators; surface acoustic wave resonators; thermal expansion; wafer bonding; .thermal expansion mismatch; Au-Au bonding; BiCMOS oscillator circuit; CTE; LSI; SAW devices; SAW resonator; argon plasma; bonding surfaces; bonding temperature; coefficients of thermal expansion; direct integration; high-performance one-chip oscillators; large-scale integrated circuits; lithium niobate; multiband wireless front-ends; one-chip SAW oscillator; one-chip wireless systems; piezoelectric crystals; resonant frequency; sacrificial etching; special cut angle; support wafer; surface acoustic wave devices; wafer-bonding-based integration technology; wafer-level heterointegration process; Bonding; Gold; Large scale integration; Silicon; Surface acoustic wave devices; Surface acoustic waves; Surface treatment; Lithium niobate; Low temperature bonding; SAW device; Wafer-level integration;
Conference_Titel :
Ultrasonics Symposium (IUS), 2010 IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4577-0382-9
DOI :
10.1109/ULTSYM.2010.5935651