DocumentCode :
1956077
Title :
Simulation of levitation control for a micromachined electrostatically levitated gyroscope
Author :
Qijun Xiao ; Wenyuan Chen ; Gaoyin Ma ; Feng Cui ; Shengyong Li ; Weiping Zhang
Author_Institution :
Res. Inst. of Micro/Nanometer Sci. & Technol., Shanghai Jiaotong Univ., Shanghai
fYear :
2009
fDate :
5-8 Jan. 2009
Firstpage :
160
Lastpage :
163
Abstract :
An electrostatically levitated gyroscope based on UV-LIGA fabrication process is introduced. The stable levitation is vitally important for the gyroscope to work efficiently. Two types of levitation control model of such a device are presented to realize initial levitation. The axial squeeze film damping coefficient is calculated by finite element analysis and deduced by analytical solution. From the analysis of the proportional integral differential (PID) control completed by the bias and the feedback linearization control (FLC) without bias. It can be seen that the PID control with the bias can linearize the control equation near the null position and FLC can realize the large travel with desired dynamic performance and global stability. But it has steady-state error, which can be switched to the PID controller to minimize. At last, the levitation control system is constructed.
Keywords :
LIGA; finite element analysis; gyroscopes; magnetic levitation; micromechanical devices; three-term control; ultraviolet lithography; UV-LIGA fabrication; axial squeeze film damping coefficient; feedback linearization control; finite element analysis; levitation control; micromachined electrostatically levitated gyroscope; proportional integral differential control; Damping; Electrostatic levitation; Fabrication; Finite element methods; Gyroscopes; Integral equations; Linear feedback control systems; Pi control; Proportional control; Three-term control; control; electrostatically; levitation; micro-gyroscope;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4244-4629-2
Electronic_ISBN :
978-1-4244-4630-8
Type :
conf
DOI :
10.1109/NEMS.2009.5068549
Filename :
5068549
Link To Document :
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