DocumentCode
1956366
Title
High temperature stressing of SiC JFETs at 300/spl deg/C
Author
Scozzie, Charles J. ; Tipton, C. Wesley ; DeLancey, W. Merle ; McGarrity, J.M. ; McLean, F.Barry
Author_Institution
U.S. Army Res. Lab., Adelphi, MD, USA
fYear
1994
fDate
11-14 April 1994
Firstpage
351
Lastpage
358
Abstract
Silicon carbide is an important emerging semiconductor technology for high power and high temperature applications. Although many papers in the literature report some of the characteristics and advantages of various SiC devices, very little information is available on the test and operation of these devices for an extended period of time. For our study a special lot of SiC JFETs was fabricated and packaged by CREE Research Inc. These devices were delivered to the Army Research Laboratory where they have been electrically characterized, radiation tested and, as reported here, subjected to thermal stress at 300/spl deg/C for 1000 hours under various bias conditions.<>
Keywords
junction gate field effect transistors; power transistors; reliability; semiconductor device testing; semiconductor materials; silicon compounds; thermal stresses; 1000 h; 300 degC; JFETs; SiC; bias conditions; electrical characterization; high power applications; high temperature applications; high temperature stressing; radiation test; semiconductor technology; thermal stress; Circuits; Gallium arsenide; JFETs; Laboratories; Packaging; Photonic band gap; Silicon carbide; Temperature; Testing; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1994. 32nd Annual Proceedings., IEEE International
Conference_Location
San Jose, CA, USA
Print_ISBN
0-7803-1357-7
Type
conf
DOI
10.1109/RELPHY.1994.307813
Filename
307813
Link To Document