DocumentCode :
1956366
Title :
High temperature stressing of SiC JFETs at 300/spl deg/C
Author :
Scozzie, Charles J. ; Tipton, C. Wesley ; DeLancey, W. Merle ; McGarrity, J.M. ; McLean, F.Barry
Author_Institution :
U.S. Army Res. Lab., Adelphi, MD, USA
fYear :
1994
fDate :
11-14 April 1994
Firstpage :
351
Lastpage :
358
Abstract :
Silicon carbide is an important emerging semiconductor technology for high power and high temperature applications. Although many papers in the literature report some of the characteristics and advantages of various SiC devices, very little information is available on the test and operation of these devices for an extended period of time. For our study a special lot of SiC JFETs was fabricated and packaged by CREE Research Inc. These devices were delivered to the Army Research Laboratory where they have been electrically characterized, radiation tested and, as reported here, subjected to thermal stress at 300/spl deg/C for 1000 hours under various bias conditions.<>
Keywords :
junction gate field effect transistors; power transistors; reliability; semiconductor device testing; semiconductor materials; silicon compounds; thermal stresses; 1000 h; 300 degC; JFETs; SiC; bias conditions; electrical characterization; high power applications; high temperature applications; high temperature stressing; radiation test; semiconductor technology; thermal stress; Circuits; Gallium arsenide; JFETs; Laboratories; Packaging; Photonic band gap; Silicon carbide; Temperature; Testing; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1994. 32nd Annual Proceedings., IEEE International
Conference_Location :
San Jose, CA, USA
Print_ISBN :
0-7803-1357-7
Type :
conf
DOI :
10.1109/RELPHY.1994.307813
Filename :
307813
Link To Document :
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