DocumentCode
1957089
Title
Fine thickness control of amorphous silicon by wet-etching for low loss wire waveguide
Author
Furuya, Katsumi ; Sakakibara, Youichi ; Nakanishi, Koichi ; Takei, Ryohei ; Itoga, Emiko ; Suzuki, Masao ; Okano, Makoto ; Kamei, Toshihiro ; Mori, Masahiko
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear
2011
fDate
14-16 Sept. 2011
Firstpage
109
Lastpage
111
Abstract
Isotropic wet-etching without surface roughening was applied to an a-Si:H film with nanometer-scale thickness controllability. Record ~1.2 dB/cm low propagation loss was obtained in an etched wire waveguide, being comparable to those of SOI waveguides.
Keywords
amorphous semiconductors; elemental semiconductors; etching; hydrogen; optical control; optical films; optical losses; optical waveguides; semiconductor thin films; silicon; surface roughness; thickness control; Si:H; amorphous silicon; isotropic wet-etching; low loss wire waveguide; propagation loss; surface roughening; thickness control; Etching; Optical waveguides; Rough surfaces; Silicon; Surface roughness; Wires; AFM; Amorphous silicon; RIfS; Silicon photonics; Surface roughness; TMAH; Wet-etching; Wire waveguide;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2011 8th IEEE International Conference on
Conference_Location
London
ISSN
1949-2081
Print_ISBN
978-1-4244-8338-9
Type
conf
DOI
10.1109/GROUP4.2011.6053732
Filename
6053732
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