Design and implementation of software system of E-beam lithography based on SEM

In this paper, a newly developed software system for electron beam lithography based on SEM is introduced. This software system consists of exposure layout processing functional module, alignment control functional module and exposure control functional module. It can accomplish the microlithography and micro-nanofabrication layouts design, generate the exposure data files, detect and correct the hardware, and control the whole process of exposure. Furthermore, the software system can be used in various electron beam lithography systems based on scanning electron microscope (SEM) with its powerful functions and friendly manipulation. The software system plays an important role in the electron beam lithography system based on SEM.