• DocumentCode
    1958214
  • Title

    Design and implementation of SiGe HPTs using an 80GHz SiGe bipolar process technology

  • Author

    Rosales, Marc D. ; Polleux, Jean-Luc ; Algani, Catherine

  • Author_Institution
    ESIEE Paris, Univ. Paris-Est, Paris, France
  • fYear
    2011
  • fDate
    14-16 Sept. 2011
  • Firstpage
    243
  • Lastpage
    245
  • Abstract
    We present the design and characterization of SiGe Heterojunction Phototransistors using an 80GHz commercial SiGe Bipolar process. It is shown that 50μm HPTs are exhibits highest gain.bandwidth product of 0.8GHz.A/W compared to the 10μm HPTs.
  • Keywords
    Ge-Si alloys; bipolar transistor circuits; phototransistors; HPT; SiGe; bipolar process technology; frequency 80 GHz; heterojunction phototransistors; size 50 mum; Fiber optics; Frequency measurement; Gain; Gain measurement; Integrated optics; Optical device fabrication; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2011 8th IEEE International Conference on
  • Conference_Location
    London
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-8338-9
  • Type

    conf

  • DOI
    10.1109/GROUP4.2011.6053777
  • Filename
    6053777