Title :
Design and fabrication of the microplasma reactor for maskless scanning plasma etching
Author :
Wen, Li ; Zhang, Qiuping ; Xiang, Weiwei ; Wang, Hai ; Chu, Liaru
Author_Institution :
Dept. of Precision Machinery & Precision Instrum., Univ. of Sci. & Technol. of China, Hefei
Abstract :
A novel maskless micro-nano plasma etching system based on parallel probe actuation is proposed. The advantages of this system are high etching rate, high fidelity, simple-structure, and flexible to fabricate various material. As a key component of the system, a microplasma reactor of metal-dielectric-metal sandwich structure with inverted, square pyramidal hollow cathode is designed and successfully fabricated with good quality. Experiment results show that the devices can discharge stably, and the V-I characteristics of the microdischarge at 4 Kpa~16 KPa of Ar and SF6/Ar gas mixture are also presented. The results of this paper may lay a foundation for further maskless scanning plasma etching.
Keywords :
argon; cathodes; discharges (electric); plasma sources; plasma transport processes; sputter etching; sulphur compounds; Ar; SF6-Ar; V-I characteristics; etching rate; maskless scanning plasma etching; metal-dielectric-metal sandwich structure; microdischarge; micronano plasma etching system; microplasma reactor design; microplasma reactor fabrication; parallel probe actuation; pressure 4 kPa; square pyramidal hollow cathode; Argon; Cathodes; Etching; Fabrication; Inductors; Plasma applications; Plasma materials processing; Plasma properties; Probes; Sandwich structures; V-I characteristicstic; etching; microfabrication; microplasma;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4244-4629-2
Electronic_ISBN :
978-1-4244-4630-8
DOI :
10.1109/NEMS.2009.5068646
